Browsing by Author "Gessner, T."

Now showing 1 - 5 of 5

Comparison of techniques to characterise the density, porosity and elastic modulus of porous low-K SiO2 xerogel films

Murray, C.
;
Flannery, C.
;
Streiter, I.
;
Schulz, S. E.
;
Baklanov, Mikhaïl
;
Mogilnikov, K. P.
Journal article
2002, Microelectronic Engineering, (60) 1_2, p.133-141
Comparison of techniques to characterize the density, porosity and elastic modules of porous low-k SiO2 xerogel films

Murray, C.
;
Flannery, C.
;
Streiter, I.
;
Schulz, S. E.
;
Baklanov, Mikhaïl
;
Mogilnikov, K. P.
Oral presentation
2001, MAM - European Workshop on Materials for Advanced Metallization; 5-7 March 2001; Sigtuna, Sweden.
Ellipsometric study of the change in the porosity of silica xerogels after chemical modification of the surface with hexamethyldisilazane

Himcinschi, C.
;
Friedrich, M.
;
Frühauf, S.
;
Streiter, I.
;
Schulz, S.E.
;
Gessner, T.
Journal article
2002, Analytical and Bioanalytical Chemistry, 374, p.654-657
Ellipsometric study of the change in the porosity of silica xerogels after surface chemical modification with hexamethyldisilizane

Himcinschi, C.
;
Friedrich, M.
;
Frühauf, S.
;
Streiter, I.
;
Schulz, S. E.
;
Gessner, T.
Oral presentation
2001, 11. Tagung Festkörperanalytik. 11th Conference on Solid State Analytics; 25-28 June 2001; Chemnitz.
Scaling down thickness of ULK materials for 65 node and below and its efect on electrical performance

Fruhauf, S.
;
Himcinschi, C.
;
Rennau, M.
;
Schulze, K.
;
Schulz, S.E.
;
Friedrich, M.
;
Gessner, T.
Journal article
2005, Microelectronic Engineering, (82) 3_4, p.405-410