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Browsing by Author "Goes, W."

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    A rigorous study of measurement techniques for negative bias temperature instability

    Grasser, T.
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    Wagner, P. J.
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    Hehenberger, P.
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    Goes, W.
    ;
    Kaczer, Ben  
    Journal article
    2008-09, IEEE Transactions on Device and Materials Reliability, (8) 3, p.526-536
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    Characterization and modeling of charge trapping: From single defects to devices

    Grasser, T.
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    Rzepa, G.
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    Waltl, M.
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    Goes, W.
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    Rott, K.
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    Rott, G.
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    Reisinger, H.
    ;
    Franco, Jacopo  
    Proceedings paper
    2014, IEEE International Conference on IC Design & Technology - ICICDT, 28/05/2014, p.1-4
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    Critical modeling issues in negative bias temperature instability

    Grasser, Tibor
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    Goes, W.
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    Kaczer, Ben  
    Proceedings paper
    2009-05, Silicon Nitride, Silicon Dioxide, and Alternate Emerging Dielectrics 10, 24/05/2009, p.265-287
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    Defect creation stimulated by thermally activated hole trapping as the driving force behind negative bias temperature instability in SiO2, SiON, and high-k gate stacks

    Grasser, T.
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    Kaczer, Ben  
    ;
    Aichinger, T.
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    Goes, W.
    ;
    Nelhiebel, M.
    Proceedings paper
    2008, IEEE Integrated Reliability Workshop - IRW, 12/10/2008, p.91-95
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    Direct tunneling and gate current fluctuations

    Baumgartner, O.
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    Bina, M.
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    Goes, W.
    ;
    Schanovsky, F.
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    Toledano Luque, Maria
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    Kaczer, Ben  
    ;
    Kosina, H.
    Proceedings paper
    2013, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 3/09/2013, p.17-20
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    Hydrogen-related volatile defects as the possible cause for the recoverable component of NBTI

    Grasser, T.
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    Rott, K.
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    Reisinger, H.
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    Waltl, M.
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    Wagner, P.
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    Schanovsky, F.
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    Goes, W.
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    Pobegen, G.
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.409-412
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    On the impact of mechanical stress on gate oxide trapping

    Goes, W.
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    Grasser, T.
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    Kruv, Anastasiia  
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    Kaczer, Ben  
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    Grill, Alexander  
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    Gonzalez, Mario  
    Proceedings paper
    2020, IEEE International Reliability Physics Symposium (IRPS), APR 28-MAY 30, 2020
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    Physical modeling of NBTI: from individual defects to devices

    Rzepa, G.
    ;
    Goes, W.
    ;
    Rott, G.
    ;
    Rott, K.
    ;
    Karner, M.
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    Kernstock, C.
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    Kaczer, Ben  
    ;
    Reisinger, H.
    Proceedings paper
    2014, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 9/09/2014, p.81-84
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    The "permanent" component of NBTI revisited: saturation, degradation-reversal, and annealing

    Grasser, T.
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    Waltl, M.
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    Rzepa, G.
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    Goes, W.
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    Wimmer, Y.
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    El-Sayed, A.-M.
    ;
    Shluger, A. L.
    ;
    Reisinger, H.
    Proceedings paper
    2016, IEEE International Reliability Physics Symposium - IRPS, 17/04/2016, p.5A-2-1-5A-2-8
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    Understanding correlated drain and gate current fluctuations

    Goes, W.
    ;
    Toledano Luque, Maria
    ;
    Baumgartner, O.
    ;
    Bina, M.
    ;
    Schanovsky, F.
    ;
    Kaczer, Ben  
    ;
    Grasser, T.
    Proceedings paper
    2013, 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits - IPFA, 15/07/2013, p.51-56
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    Understanding negative bias temperature instability in the context of hole trapping

    Grasser, T.
    ;
    Kaczer, Ben  
    ;
    Goes, W.
    ;
    Aichinger, T.
    ;
    Hehenberger, P.
    ;
    Nelhiebel, M.
    Journal article
    2009, Microelectronic Engineering, (86) 7_9, p.1876-1882

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