Browsing by Author "Goes, W."
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Publication A rigorous study of measurement techniques for negative bias temperature instability
Journal article2008-09, IEEE Transactions on Device and Materials Reliability, (8) 3, p.526-536Publication Characterization and modeling of charge trapping: From single defects to devices
Proceedings paper2014, IEEE International Conference on IC Design & Technology - ICICDT, 28/05/2014, p.1-4Publication Critical modeling issues in negative bias temperature instability
Proceedings paper2009-05, Silicon Nitride, Silicon Dioxide, and Alternate Emerging Dielectrics 10, 24/05/2009, p.265-287Publication Defect creation stimulated by thermally activated hole trapping as the driving force behind negative bias temperature instability in SiO2, SiON, and high-k gate stacks
Proceedings paper2008, IEEE Integrated Reliability Workshop - IRW, 12/10/2008, p.91-95Publication Direct tunneling and gate current fluctuations
;Baumgartner, O. ;Bina, M. ;Goes, W. ;Schanovsky, F. ;Toledano Luque, Maria; Kosina, H.Proceedings paper2013, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 3/09/2013, p.17-20Publication Hydrogen-related volatile defects as the possible cause for the recoverable component of NBTI
;Grasser, T. ;Rott, K. ;Reisinger, H. ;Waltl, M. ;Wagner, P. ;Schanovsky, F. ;Goes, W.Pobegen, G.Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.409-412Publication On the impact of mechanical stress on gate oxide trapping
Proceedings paper2020, IEEE International Reliability Physics Symposium (IRPS), APR 28-MAY 30, 2020Publication Physical modeling of NBTI: from individual defects to devices
Proceedings paper2014, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 9/09/2014, p.81-84Publication The "permanent" component of NBTI revisited: saturation, degradation-reversal, and annealing
;Grasser, T. ;Waltl, M. ;Rzepa, G. ;Goes, W. ;Wimmer, Y. ;El-Sayed, A.-M. ;Shluger, A. L.Reisinger, H.Proceedings paper2016, IEEE International Reliability Physics Symposium - IRPS, 17/04/2016, p.5A-2-1-5A-2-8Publication Understanding correlated drain and gate current fluctuations
;Goes, W. ;Toledano Luque, Maria ;Baumgartner, O. ;Bina, M. ;Schanovsky, F.; Grasser, T.Proceedings paper2013, 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits - IPFA, 15/07/2013, p.51-56Publication Understanding negative bias temperature instability in the context of hole trapping
Journal article2009, Microelectronic Engineering, (86) 7_9, p.1876-1882