Browsing by Author "Gogolides, E."

Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions

Lithographic evaluation of a new wet silylation process using safe solvents and the commercial photoresist AZ 5214E

Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images

Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis

Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness