Browsing by Author "Granik, Yuri"
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Publication Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Proceedings paper2009, Design for Manufacturability through Design-Process Integration III, 22/02/2009, p.72750XPublication Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
Publication Contour-based self-aligning calibration of OPC models
Proceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382MPublication Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.68240LPublication Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.43001Publication Physically-based compact models for fast lithography simulation
Publication Validation of improved compact model in grapho-epitaxy Directed-Self-Assembly (DSA)
Proceedings paper2015, 1st International Symposium on DSA, 26/10/2015