Browsing by Author "Grenville, Andrew"
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Publication Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97760BPublication Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations
Publication Initial assessment of the impact of the use of a hard pellicle on imaging
Proceedings paper2003, 4th International Symposium on 157nm Lithography, 25/08/2003Publication Integrated fab process for metal oxide EUV photoresist
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.94250SPublication Metal oxide EUV photoresist performance for N7 relevant patterns and processes
Proceedings paper2016, Advances in Patterning Materials and Processes XXXIII, 21/02/2016, p.977904