Browsing by Author "Harada, Ken"
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Publication Improvement in post-Chemical Mechanical Planarization cleaning process for Ru interconnects
Oral presentation2019, The Surface Preparation And CLeaning Conference (SPCC)Publication Investigation of chemical mechanical planarization (CMP) and post-CMP cleanig for Molybdenum
Oral presentation2019, International Interconnect Technology Confference 2019 (IITC/MAM)Publication Selective Si Etchant for Gate-All-Around Transistors with Si1-xGex Channel
Meeting abstract2021, Surface Preparation and Cleaning Conference (SPCC), 2021Publication Si1-xGex selective etchant for gate-all-around transistors
Proceedings paper2021, International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS, 22/09/2020, p.71-78