Browsing by Author "Harada, Yoshinao"
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Publication Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Proceedings paper2007, Symposium on VLSI. Technology Digest of Technical Papers, 14/06/2007, p.158-159Publication Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application
Publication Reliability study of La2O3 capped HfSiON high-permittivity n-type metal-oxide-semiconductor field-effect transistor devices with tantalum-rich electrodes
Journal article2008, Journal of Applied Physics, (104) 4, p.44500