Browsing by Author "Hooge, Joshua"
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Publication A CDU comparison of double-patterning process options using Monte Carlo simulation
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72741UPublication Comparison of directed self-assembly integrations
Proceedings paper2012, Advances in Resist Materials and Processing Technology XXIX, 12/02/2012, p.83250GPublication EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Oral presentation2010, 54th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBNPublication EUV RLS performance tradeoffs for a polymer bound PAG resist
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.76390MPublication EUV secondary electron blur at the 22nm half pitch node
Proceedings paper2011, Extreme Ultravioet (EUV) Lithography II, 27/02/2011, p.796904Publication Image contrast contributions to immersion lithography defect formation and process yield
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69244WPublication Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13017Publication Understanding and improving double patterning CDU through Monte Carlo simulation
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008