Browsing by Author "Isawa, Miki"
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Publication Application of model-based library approach to photoresist pattern shape measurement in advenced lithography
Publication Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process
Publication Dry Resist Metrology Readiness for High-NA EUVL
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 1249612Publication In-line Metrology for Vertical Edge Placement Control of Monolithic CFET using CD-SEM
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023Publication Line edge roughness measurement technique of fingerprint in block copolymer thin film
Proceedings paper2013, Metrology, Inspection, and Process Control for Microlithography XXVII, 25/02/2013, p.868114Publication MuGFET Observation and CD measurement by using CD-SEM
Publication Validation of CD-SEM etching residue evaluation technique for MuGFET structures
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72720QPublication Verification and extension of the MBL technique for photoresist pattern shape measurement