Browsing by Author "Jakschik, Stefan"
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Publication Improved thermal stability of Ni-silicides on Si:C epitaxial layers
Journal article2007, Microelectronic Engineering, 84, p.2542-2546Publication Ni(Pt)Si thermal stability improvement by carbon implantation
Proceedings paper2008, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS 4: New Materials, Processes, and Equipment, 18/05/2008, p.397-404Publication Selective epitaxial Si/SiGe growth for VT shift adjustment in high k pMOS devices
Journal article2007, Semiconductor Science and Technology, (22) 1, p.S110-S113Publication The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics
Journal article2008-07, IEEE Electron Device Letters, (29) 7, p.743-745