Browsing by Author "Jiang, Jing"
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Publication Difference in EUV photoresist design towards reduction of LWR and LCDU
Proceedings paper2017, Advances in Patterning Materials and Processes XXXIV, 27/02/2017, p.101460APublication Impact of acid statistics on EUV local critical dimension uniformity
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography, 27/02/2017, p.1014323Publication Metal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution
Journal article2017, Journal of Photopolymer Science and Technology, (30) 5, p.591-597Publication Role of metal sensitizers for sensitivity improvement in EUV chemically amplified resist
Journal article2019-01, Journal of Photopolymer Science and Technology, (31) 6, p.747-751Publication Sensitizers in EUV chemically amplified resist: mechanism of sensitivity improvement
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 25/02/2018, p.1058307Publication Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement
Journal article2019-12, Journal of Micro/Nanolithography MEMS and MOEMS, (17) 4, p.43506Publication Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure
Proceedings paper2017, International Conference on Extreme Ultraviolet Lithography 2017, 11/09/2017, p.104500H-1-104500H-7