Browsing by Author "Kang, Seulki"
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Publication Advanced high voltage e-beam system combined with an enhanced D2DB for on-device overlay measurement
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124961WPublication Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 041603Publication E-beam metrology-based EUVL aberration monitoring
;Kang, Seulki ;Miura, Yuji ;Maruyama, Kotaro ;Yamazaki, Yuichiro ;Wei, Chih-, IMaguire, EthanProceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.120530ZPublication Massive e-beam metrology and inspection for analysis of EUV stochastic defect
Proceedings paper2021, Metrology, Inspection, and Process Control for Microlithography XXXIV, 22/02/2021, p.1161129