Browsing by Author "Kiers, Ton"
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Publication CD-SEM distortion quantification for EPE metrology and contour analysis
Proceedings paper2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.1014515Publication Co-optimization of lithographic and patterning processes for improved EPE performance
Publication SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 27/02/2017, p.101430HPublication The imec iN7 EUV platform: M2-Block and Via patterning developments
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016