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Browsing by Author "Kim, In Sung"

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    EUV lithography program at IMEC

    Goethals, Mieke
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    Jonckheere, Rik  
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    Lorusso, Gian  
    ;
    Hermans, Jan  
    ;
    Van Roey, Frieda  
    ;
    Myers, Alan
    Proceedings paper
    2007, Emerging Lithographic Technologies XI, 27/02/2007, p.651709
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    EUV pattern shift compensation strategies

    Schmoeller, Thomas
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    Klimpel, Thomas
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    Kim, In Sung
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    Lorusso, Gian  
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    Myers, Alan
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    Jonckheere, Rik  
    Proceedings paper
    2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69211B
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    EUVL at IMEC: shadowing compensation and Flare mitigation

    Lorusso, Gian  
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    Goethals, Mieke
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    Jonckheere, Rik  
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    Hermans, Jan  
    ;
    Ronse, Kurt  
    ;
    Myers, Alan
    Journal article
    2007-11, Journal of Vacuum Science and Technology B, (25) 6
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    Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

    Myers, Alan
    ;
    Lorusso, Gian  
    ;
    Kim, In Sung
    ;
    Goethals, Mieke
    ;
    Jonckheere, Rik  
    ;
    Hermans, Jan  
    Journal article
    2008, Journal of Vacuum Science and Technology B, (26) 6, p.2215-2219
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    Full field EUV lithography turning into reality at IMEC

    Jonckheere, Rik  
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    Lorusso, Gian  
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    Goethals, Mieke
    ;
    Hermans, Jan  
    ;
    Baudemprez, Bart  
    ;
    Myers, Alan
    Proceedings paper
    2007, Photomask Japan (PMJ) - Photomask and Next-Generation Lithography Mask Technology XIV, 17/04/2007, p.66070H
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    Imaging performance of the EUV alpha demo tool at IMEC

    Lorusso, Gian  
    ;
    Hermans, Jan  
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    Goethals, Mieke
    ;
    Baudemprez, Bart  
    ;
    Van Roey, Frieda  
    ;
    Myers, Alan
    Proceedings paper
    2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69210O
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    Progress in full field EUV lithography program at IMEC

    Goethals, Mieke
    ;
    Lorusso, Gian  
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    Jonckheere, Rik  
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    Baudemprez, Bart  
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    Hermans, Jan  
    ;
    Iwamoto, Fumio
    Proceedings paper
    2007, International EUVL Sympsoium, 28/10/2007
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    Status of EUV lithography at IMEC

    Goethals, Mieke
    ;
    Jonckheere, Rik  
    ;
    Lorusso, Gian  
    ;
    Hermans, Jan  
    ;
    Van Roey, Frieda  
    ;
    Myers, Alan
    Journal article
    2007, Journal of Photopolymer Science & Technology, (20) 3, p.383-292

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