Browsing by Author "Kishimura, Shinji"
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Publication Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication Impact of water and top-coats on lithographic performance in 193nm immersion lithography
Proceedings paper2005, Advances in Resist Technology and Processing XXII, 27/02/2005, p.20-30Publication Interactions at the interface between top-coat and resist
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Proceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65190EPublication Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
Proceedings paper2005, 2nd International Symposium on Immersion Lithography, 12/09/2005Publication Study of leaching behavior in immersion lithography by the GSP method
Proceedings paper2005, 52th Spring Meeting of the Japanese Society of Applied Physics and Related Societies, 29/03/2005