Browsing by Author "Kitano, Junichi"
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Publication EUV process sensitivities and optimizations for track processing
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Oral presentation2010, 54th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBNPublication EUV RLS performance tradeoffs for a polymer bound PAG resist
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.76390MPublication EUV RLS performance tradeoffs for a polymer bound PAG resist process
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
Proceedings paper2008, Advances in Resist Materials and Processing Technology XXV, 24/02/2008, p.692315Publication Image contrast contributions to immersion lithography defect formation and process yield
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69244WPublication LWR reduction by novel lithographic and etch techniques
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.763914Publication Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727347Publication Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13017