Browsing by Author "Klipp, Andreas"
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Publication All-wet removal of post-etch photoresist and sidewall residues: Electrical characterization of 90 nm and 30 nm ½ pitch structures
Meeting abstract2010, SEMATECH Surface Preparation and Cleaning Conference, 22/03/2010Publication Challenges in BEOL cleaning for the 10 nm node and beyond
; ; ; Publication Implanted photoresist remover for advanced nodes including SiGe, Ge and high k-metals
Proceedings paper2013, Ultra Clean Processing of Semiconductor Surfaces XI - UCPSS, 17/09/2012, p.17-20Publication New cleaning solutions for all-wet-post etch residue removal on Cu BEOL for sub 45nm nodes
Proceedings paper2009, Sematech Surface Preparation and Cleaning Conference, 23/03/2009Publication Removal of photoresist and BARC in Cu BEOL using an all-wet process
Proceedings paper2009, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11, 4/10/2009, p.173-178Publication Wet clean in BEOL interconnect: Post etch residue removal and material compatibility
; ; ; Publication Wet-chemical cleaning of cobalt and molybdenum for advanced interconnects
Meeting abstract2020, Surface Preparation and Cleaning Conference 2020 - SPCC, 31/08/2020