Browsing by Author "Klostermann, Ulrich K."
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Publication Accurate models for EUV simulation and their use for design correction
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Calibration of physical resist models for simulation of extreme ultraviolet lithography
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13007Publication Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763619