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Browsing by Author "Koshihara, Shunsuke"

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    Enabling CD SEM metrology for 5nm technology node and beyond

    Lorusso, Gian  
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    Ohashi, Takeyoshi
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    Yamaguchi, Astuko
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    Inoue, Osamu
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    Sutani, Takumichi
    Proceedings paper
    2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.1014512
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    Impact of annealing temperature on DSA process: toward faster assembly kinetics

    Suh, Hyo Seon  
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    Nair, Vineet Vijayakrishnan  
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    Rincon Delgadillo, Paulina  
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    Doise, Jan  
    Proceedings paper
    2018, Advances in Patterning Materials and Processes XXXV, 24/02/2018, p.105860T
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    LCDU and placement improvement of contacts using EUV templated DSA

    Boeckx, Carolien
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    Doise, Jan  
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    Chan, BT  
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    Lorusso, Gian  
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    Sutani, Takumichi
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    Koshihara, Shunsuke
    Oral presentation
    2018, SPIE 2018
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    Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

    Lorusso, Gian  
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    Inoue, Osamu
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    Ohashi, Takeyoshi
    ;
    Altamirano Sanchez, Efrain  
    Proceedings paper
    2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.97780V

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