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Browsing by Author "Kubota, M."

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    Cleaning of metal contamination

    Mertens, Paul  
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    Hurd, Trace
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    Gräf, D.
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    Meuris, Marc  
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    Schmidt, Harald
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    Heyns, Marc  
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    Kwakman, L.
    Proceedings paper
    1994, Contamination Control and Defect Reduction in Semiconductor Manufacturing III, 23/05/1994, p.241-252
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    Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application

    Niwa, Masaaki
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    Mitsuhashi, Riichirou
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    Yamamoto, K.
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    Hayashi, S.
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    Harada, Yoshinao
    Proceedings paper
    2005-10, Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM, 13/09/2005, p.6-7
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    Ni-FUSI on high-k as a candidate for 65nm LSTP CMOS

    Kubicek, Stefan  
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    Veloso, Anabela  
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    Kottantharayil, Anil
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    Hayashi, Shigenori
    Proceedings paper
    2005-04, Proceedings IEEE VLSI-TSA International Symposium on VLSI Technology, 25/04/2005, p.99-100
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    Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application

    Niwa, Masaaki
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    Mitsuhashi, Riichirou
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    Yamamoto, Kazuhiko
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    Hayashi, S.
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    Harada, Y.
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    Kubota, M.
    Meeting abstract
    2005, Meeting Abstracts 208th Meeting of the Electrochemical Society, 16/10/2005, p.516

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