Browsing by Author "Langner, Andreas"
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Publication EUV resist contrast loss determination using interference lithography
Publication Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Measuring resist-induced contrast loss using EUV interference lithography
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.76362X