Browsing by Author "Litt, Lloyd C."

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Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode

Montgomery, Patrick K.
;
Lucas, Kevin D.
;
Litt, Lloyd C.
;
Conley, Will
;
Fanucchi, Eric
Proceedings paper
2003-12, 23rd Annual BACUS Symposium on Photomask Technology, 8/09/2003, p.814-825
Mighty hight-t lithography for 65nm generation contacts

Conley, Will
;
Montgomery, Patrick
;
Lucas, Kevin
;
Litt, Lloyd C.
;
Maltabes, John G.
;
Dieu, Laurent
Proceedings paper
2003, Optical Microlithography XVI, 23/02/2003, p.1210-1219
Process, design and optical proximity correction requirements for the 65nm device generation

Lucas, Kevin
;
Montgomery, Patrick
;
Litt, Lloyd C.
;
Conley, Will
;
Postnikov, Sergei V.
;
Wu, Wei
Proceedings paper
2003, Optical Microlithography XVI, 23/02/2003, p.408-419