Browsing by Author "Lyons, Adam"
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Publication Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.101431EPublication Mask 3D effect mitigation by source optimization and assist feature placement
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication Mask Contribution to OPC Model Accuracy
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020, p.115171D