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Browsing by Author "Maekawa, K"

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    Cryoetching of silicon and advanced materials for 3D interconnects

    Dussart, R.
    ;
    Tillocher, T.
    ;
    Gosset, N
    ;
    Lefaucheux, P.
    ;
    L'jazouli, R
    ;
    Boufnichel, M.
    ;
    Zhang, Liping  
    Meeting abstract
    2014, ECS Fall Meeting Symposium P5: Processing Materials of 3D Interconnects, Damascene, and Electronics Packaging 6, 5/10/2014, p.1689
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    Cryogenic etching of porous organosilicate low-k materials: fluorine based plasma analysis

    Leroy, F
    ;
    Tillocher, T
    ;
    Zhang, Liping  
    ;
    Girard, A.
    ;
    Cardinaud, C.
    ;
    Lefaucheux, P.
    Meeting abstract
    2015, Plasma Etch and Strip in Microtechnology - PESM, 27/04/2015
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    Cryogenic etching processes applied to porous low-k materials using C4F8/SF6 plasmas

    Leroy, F.
    ;
    Zhang, Liping  
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    Tillocher, T.
    ;
    Yatsuda, K.
    ;
    Maekawa, K
    ;
    Nishimura, E
    ;
    Lefaucheux, P
    Journal article
    2015, Journal of Physics D: Applied Physics, (48) 43, p.435202

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