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Browsing by Author "Maes, Herman"

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    A 180nm secondary electron injection flash device

    Xue, Gang
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    Van Houdt, Jan  
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    Haspeslagh, Luc  
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    Wellekens, Dirk  
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    Keppens, Bart
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    Maes, Herman
    Proceedings paper
    2001, IEEE Non-Volatile Semiconductor Memory Workshop, 12/08/2001, p.62-63
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    A 1Mbit HIMOS® flash memory embedded in a 0.35μm CMOS process

    Van Houdt, Jan  
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    Tsouhlarakis, Jorgo  
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    Hendrickx, Paul  
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    Vanhorebeek, Guido
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    Wellekens, Dirk  
    Oral presentation
    2000, 17th IEEE Nonvolatile Semiconductor Memory Workshop; 13-17 February 2000; Monterey, Ca, USA.
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    A 25ns/byte-programmable low-power SSI flash array with a new low-voltage erase scheme for embedded memory applications

    Van Houdt, Jan  
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    Haspeslagh, Luc  
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    Wellekens, Dirk  
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    Vanhorebeek, Guido
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    Groeseneken, Guido  
    Proceedings paper
    1995, 14th IEEE Nonvolatile Semiconductor Memory Workshop, 13/08/1995, p.2.2
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    A 5 V-Compatible Flash EEPROM Cell with Microsecond Programming Time for Embedded Memory Applications

    Van Houdt, Jan  
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    Wellekens, Dirk  
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    Faraone, Lorenzo
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    Haspeslagh, Luc  
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    Deferm, Ludo  
    Journal article
    1994, IEEE Trans. Components, Packaging, and Manufacturing Techn. Part A, (17) 3, p.380-389
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    A CAD assisted design and optimisation methodology for over-voltage ESD protection circuits

    Vassilev, Vesselin
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    Vaschenko, Vladislav
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    Jansen, Philippe
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    Choi, B.-J.
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    Concannon, An
    Journal article
    2004, Microelectronics Reliability, (44) 9_11, p.1885-1890
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    A CMOS DC voltage doubler with nonoverlapping switching control

    Kim, Shi-Ho
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    Tsouhlarakis, Jorgo  
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    Van Houdt, Jan  
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    Maes, Herman
    Journal article
    2001, IEICE Trans. Electronics, (E84C) 2, p.274-277
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    A compact model for the grounded-gate nMOS behaviour under CDM ESD stress

    Russ, Christian
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    Verhaege, Koen
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    Bock, Karlheinz
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    Roussel, Philippe  
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    Groeseneken, Guido  
    Proceedings paper
    1996, Proceedings of 18th Annual Electrical Overstress/Electrostatic Discharge Symposium, 10/09/1996, p.302-315
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    A compact model for the grounded-gate nMOS transistor behaviour under CDM ESD stress

    Russ, Christian
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    Verhaege, Koen
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    Bock, Karlheinz
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    Roussel, Philippe  
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    Groeseneken, Guido  
    Journal article
    1998, Journal of Electrostatics, (42) 4, p.351-381
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    A compact MOSFET breakdown model for optimization of gate coupled ESD protection circuits

    Vassilev, Vesselin
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    Groeseneken, Guido  
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    Bock, Karlheinz
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    Maes, Herman
    Proceedings paper
    1999, ESSDERC'99 - Proceedings of the 29th European Solid-State Device Research Conference; 13-15 September 1999; Leuven, Belgium., p.600-603
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    A comparison of extraction techniques for threshold voltage mismatch

    Croon, Jeroen
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    Tuinhout, Hans
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    Difrenza, R.
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    Knol, J.
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    Moonen, A.J.
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    Decoutere, Stefaan  
    Proceedings paper
    2002, International Conference on Microelectronic Test Structures, 8/04/2002, p.235-240
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    A comprehensive study of boron and carbon diffusion models in SiGeC heterojunction bipolar transistors

    Sibaja-Hernandez, Arturo  
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    Decoutere, Stefaan  
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    Maes, Herman
    Journal article
    2005, Journal of Applied Physics, (98) 6, p.063530-1-063530-9
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    A consistent model for the SANOS programming operation

    Furnemont, Arnaud  
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    Rosmeulen, Maarten  
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    Cacciato, Antonio
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    Breuil, Laurent  
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    De Meyer, Kristin  
    Proceedings paper
    2007, 22nd Non-Voltaile Semiconductor Memory Workshop - NVSMW, 27/08/2007, p.96-97
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    A consistent model for the thickness dependence of intrinsic breakdown in ultra-thin oxides

    Degraeve, Robin  
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    Groeseneken, Guido  
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    Bellens, Rudi
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    Depas, Michel
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    Maes, Herman
    Proceedings paper
    1995, International Electron Devices Meeting. Technical Digest, 10/12/1995, p.863-866
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    A constant reference bit-line voltage data sensing technique without reference cell for 1T1C FeRAMs

    Kim, S.
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    Kim, J.S.
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    You, I.K.
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    Lee, W.J.
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    Yu, B.G.
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    Maes, Herman
    Journal article
    2002, Integrated Ferroelectrics, 47, p.51-60
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    A fast and simple methodology for lifetime prediction of ultra-thin oxides

    Nigam, Tanya
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    Degraeve, Robin  
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    Groeseneken, Guido  
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    Maes, Herman
    Proceedings paper
    1999, Proceedings of the International Reliability Physics Symposium; March 1999; San Diego, Ca, USA., p.381-388
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    A ferroelectric capacitor model accounting for the switching kinetics and polarization relaxation

    Bartic, Andrei
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    Kaczer, Ben  
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    Wouters, Dirk
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    Maes, Herman
    Meeting abstract
    2001, 13th International Symposium on Integrated Ferroelectrics - ISIF, 11/03/2001, p.50
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    A flash memory technology with quasi-virtual ground array for low-cost embedded applications

    Tsouhlarakis, Jorgo  
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    Vanhorebeek, Guido
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    Verhoeven, Geert
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    De Blauwe, Jan
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    Kim, Shi-Ho
    Journal article
    2001, IEEE Journal of Solid-State Circuits, (36) 6, p.969-978
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    A low voltage, high performance 0.35 μm embedded flash EEPROM cell technology

    Wellekens, Dirk  
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    Van Houdt, Jan  
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    De Blauwe, Jan
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    Haspeslagh, Luc  
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    Deferm, Ludo  
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    Maes, Herman
    Proceedings paper
    1998, 16th Nonvolatile Semiconductor Memory Workshop, 2/08/1998, p.106-108
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    A method to interpret micro-Raman experiments made to measure nonuniform stresses: application to local oxidation of silicon structures

    Pinardi, Kuntjoro
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    Jain, Suresh
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    Willander, M.
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    Atkinson, A.
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    Maes, Herman
    Journal article
    1998, Journal of Applied Physics, (84) 5, p.2507-2512
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    A new analytic model for the description of the intrinsic oxide breakdown statistics of ultra-thin oxides

    Degraeve, Robin  
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    Roussel, Philippe  
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    Groeseneken, Guido  
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    Maes, Herman
    Journal article
    1996, Microelectronics and Reliability, 36, p.1639-1642
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