Browsing by Author "Maguire, Ethan"
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Publication E-beam metrology-based EUVL aberration monitoring
Publication EUV based multi-patterning schemes for advanced DRAM nodes
Proceedings paper2022, Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2022, p.Art. 1205503Publication Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing
; ; ; Kim, Ryan Ryoung hanProceedings paper2022, International Conference on Extreme Ultraviolet Lithography, SEP 26-29, 2022, p.Art. 122920W