Browsing by Author "Makhotkin, Igor"
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Publication Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Proceedings paper2023-04-28, SPIE Advanced Lithography + Patterning, 2023, p.1249407-1-1249407-10Publication Advancing X-ray metrology for routine thin film analysis
Proceedings paper2018, 13th International MicroNanoConference - iMNC, 11/12/2018Publication APT tip shape modifications during analysis, its implications, and the potential to measure tip shapes in real time via soft-X-ray ptychography
Journal article2019, Microscopy and Microanalysis, (25) S2, p.2504-2505Publication High NA EUV lithography simulation using new calibrated mask model
Proceedings paper2019, 17th Fraunhofer IISB Lithography Simulation Workshop, 26/09/2019Publication Opportunities and challenges in APT metrology for semiconductor applications
Journal article2019, Microscopy and Microanalysis, (25) Suppl. 2, p.312Publication Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124963BPublication Refined extreme ultraviolet mask stack model
Journal article2021, JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, (38) 4, p.498-503Publication Soft X-ray chemically sensitive ptychographic imaging of 3D nano-objects
Journal article2024, OPTICS EXPRESS, (32) 25, p.43788-43804Publication The refined EUVL mask model
Proceedings paper2019, 313 PTB Seminar "VUV- and EUV Metrology", 22/10/2019