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Browsing by Author "Malhouitre, Stephane"

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    Advanced wafer surface cleaning technology

    Mertens, Paul  
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    Vos, Rita  
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    Vereecke, Guy  
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    Arnauts, Sophia  
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    Bearda, Twan
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    De Waele, Rita
    Oral presentation
    2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing Seminar
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    Etching of thermal SiO2 in supercritical CO2

    Malhouitre, Stephane
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    Van Hoeymissen, Jan
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    Case, Carlye
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    Granger, Pascal
    Proceedings paper
    2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.71-78
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    Impact of CO2 cryogenic pre-treatment on ion impanted photresist wet cleaning

    Malhouitre, Stephane
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    Vos, Rita  
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    Banerjee, Souvik
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    Bearda, Twan
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    Mertens, Paul  
    Proceedings paper
    2008, Sematech Surface Preparation and Cleaning conference, 31/03/2008
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    Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments

    Totir, George
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    Frank, Martin M.
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    Vos, Rita  
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    Arnauts, Sophia  
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    Bearda, Twan
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    Kenis, Karine  
    Proceedings paper
    2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.219-226
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    Repair and sealing of mesoporous low-k dielectric by supercritical CO2 processing

    Malhouitre, Stephane
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    Van Hoeymissen, Jan
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    Le, Quoc Toan  
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    Kesters, Els  
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    Granger, P.
    Proceedings paper
    2005, SEMATECH Surface Preparation and Cleaning Conference, 19/04/2005
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    ScCO2-based processes in semiconductor manufacturing: Why did it fail ?

    Van Hoeymissen, Jan
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    Malhouitre, Stephane
    Proceedings paper
    2008, 11th European Meeting on Supercritical Fluids - ISASF, 4/05/2008
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    Stripping of ion implanted photoresist by Co2 cryogenic pre-treatment followed by wet cleaning

    Malhouitre, Stephane
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    Vos, Rita  
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    Banerjee, Souvik
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    Bearda, Twan
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    Mertens, Paul  
    Oral presentation
    2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
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    Supercritical CO2 low-k dielectric repair

    Malhouitre, Stephane
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    Van Hoeymissen, Jan
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    Muscat, Anthony
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    Granger, Pascal
    ;
    Mertens, Paul  
    Proceedings paper
    2005, Cleaning Technology in Semiconductor Devices Manufacturing IX, 16/10/2005, p.301-308

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