Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Mantl, Siegfried"

Filter results by typing the first few letters
Now showing 1 - 9 of 9
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Effects on the HE implantation energy on the strain relaxation of epitaxial Si0.8Ge0.2/Si(100) heterostructures

    Morschbacher, Mario
    ;
    da Silva, Douglas
    ;
    Fichtner, Paulo
    ;
    Zawislak, Fernando
    ;
    Hollaender, Bernd
    Oral presentation
    2004, MRS Spring meeting Symposium B: High-Mobility Group-IV Materials and Devices
  • Loading...
    Thumbnail Image
    Publication

    Fabrication, characterization and analysis of Ge/GeSn heterojunction p-type tunnel transistors

    Schulte-Braucks, Christian
    ;
    Pandey, Rahul
    ;
    Sajjad, Redwan Noor
    ;
    Barth, Mike
    ;
    Ghosh, Ram Krishna
    Journal article
    2017-09, IEEE Transactions on Electron Devices, (64) 10, p.4354-4362
  • Loading...
    Thumbnail Image
    Publication

    Fabrication, doping and characterization of strained silicon on SiO2 by ion beam techniques

    Hollaender, Bernd
    ;
    Buca, Dan
    ;
    Trinkaus, H.
    ;
    Mantl, Siegfried
    ;
    Loo, Roger  
    ;
    Reiche, Manfred
    Oral presentation
    2008, 16th International Conference on Ion Beam Modifications of Materials
  • Loading...
    Thumbnail Image
    Publication

    Ion channeling strain measurements of uniaxially strained Si/SiGe heterostructures on Si(110) and Si(110)

    Hollaender, Bernd
    ;
    Minamisawa, R.
    ;
    Buca, Dan
    ;
    Trinkaus, H
    ;
    Mantl, Siegfried
    ;
    Loo, Roger  
    Meeting abstract
    2010, 17th International Conference on Ion Beam Modification of Materials - IBMM, 22/08/2010
  • Loading...
    Thumbnail Image
    Publication

    Performance benchmarking of p-type In0.65Ga0.35As/GaAs0.4Sb0.6 and Ge/Ge0.93Sn0.07 hetero-junction tunnel FETs for low voltage logic

    Pandey, R
    ;
    Schulte-Braucks, Christian
    ;
    Sajjad, R.N.
    ;
    Barth, M.
    ;
    Ghosh, R
    ;
    Grisafe, B.
    ;
    Sharma, P.
    Proceedings paper
    2016-12, IEEE International Electron Devices Meeting - IEDM, 3/12/2016, p.520-523
  • Loading...
    Thumbnail Image
    Publication

    Strain relaxation of SiGe/Si by He implantation: controlling dislocation sources at He precipitates

    Huging, Norbert
    ;
    Luysberg, Martina
    ;
    Urban, Knut
    ;
    Buca, Dan
    ;
    Hollander, Bernd
    ;
    Mantl, Siegfried
    Proceedings paper
    2005, Nanoelectronic Days 2005, 9/02/2005
  • Loading...
    Thumbnail Image
    Publication

    Strain relaxation of SiGe/Si heterostructures by helium ionimplantation and subsequent annealing : Helium precipitates acting as dislocation sources

    Hueging, Norbert
    ;
    Luysberg, Martina
    ;
    Urban, Knut
    ;
    Buca, Dan
    ;
    Hollaender, Bernd
    ;
    Mantl, Siegfried
    Proceedings paper
    2005, Microscopy of Semiconducting Materials. Proceedings of the 14th Conference, 11/04/2005, p.97-102
  • Loading...
    Thumbnail Image
    Publication

    Strained silicon on relaxed SiGe made by strain transfer

    Mantl, Siegfried
    ;
    Buca, Dan M.
    ;
    Holländer, Bernd
    ;
    Trinkaus, Helmut
    ;
    Luysberg, Martina
    ;
    Houben, L.
    Meeting abstract
    2004, Program and Abstracts Book 2nd International SiGe Technology and Device Meeting - ISTDM, 17/05/2004, p.111-112
  • Loading...
    Thumbnail Image
    Publication

    The role of internal dislocation sources for the strain ralaxation of pseudomorphic SiGe/Si structures

    Luysberg, Martina
    ;
    Hueging, Norbert
    ;
    Lenk, Steffi
    ;
    Buca, Dan
    ;
    Hollaender, Bernd
    Oral presentation
    2004, MRS Spring Meeting Symposium B: High-Mobility Group-IV Materials and Devices

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings