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Browsing by Author "Marsik, Premysl"

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    Application of UV irradiation in removal of post-etch 193 nm photoresist

    Le, Quoc Toan  
    ;
    Kesters, Els  
    ;
    Prager, Lutz
    ;
    Lux, Marcel  
    ;
    Marsik, Premysl
    ;
    Vereecke, Guy  
    Proceedings paper
    2009, Materials, Processes and Reliability for Advanced Interconnects for Micro and Nanoelectronics, 13/04/2009, p.D02-09
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    Changes of UV optical properties of plasma damaged low-k dielectrics for sidewall damage scatterometry

    Marsik, Premysl
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    Urbanowicz, Adam
    ;
    Vinokur, Klara
    ;
    Cohen, Yoel
    ;
    Baklanov, Mikhaïl
    Proceedings paper
    2008, Materials and Processes for Advanced Interconnects for Microelectronics, 24/03/2008, p.1079-N07-04
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    Effect of pressure on efficiency of UV curing of CVD low-k material at different wavelengths

    Prager, Lutz
    ;
    Naumov, Sergei
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    Pistol, L.
    ;
    Wennrich, L.
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    Buchmeister, M. R.
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    Marsik, Premysl
    Meeting abstract
    2008, 17th Workshop Materials for Advanced Metallization, 2/03/2008
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    Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths

    Prager, L.
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    Marsik, Premysl
    ;
    Wennrich, L.
    ;
    Baklanov, Mikhaïl
    ;
    Naumov, S.
    ;
    Pistol, L.
    ;
    Schneider, D.
    Journal article
    2008, Microelectronic Engineering, (85) 10, p.2094-2097
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    Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance

    Marsik, Premysl
    ;
    Urbanowicz, Adam
    ;
    Verdonck, Patrick  
    ;
    De Roest, David  
    ;
    Sprey, Hessel  
    Journal article
    2011, Thin Solid Films, (519) 11, p.3619-3626
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    Engineering of chemical and physical properties of low-k materials by different wavelength of UV light

    Baklanov, Mikhaïl
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    Marsik, Premysl
    ;
    Verdonck, Patrick  
    ;
    Ferchichi, Abdelkarim
    ;
    Urbanowicz, Adam
    Proceedings paper
    2008, ADMETA: Advanced Metallization Conference, 8/10/2008, p.28-29
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    Improved low-k dielectric properties using He/H2 plasma for resist removal

    Urbanowicz, Adam
    ;
    Shamiryan, Denis
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    Marsik, Premysl
    ;
    Travaly, Youssef
    ;
    Jonas, Alain
    Proceedings paper
    2009, Advanced Metallization Conference 2008 (AMC 2008), 22/09/2008, p.593-598
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    Improved low-k dielectric properties using He/H2 plasma for resist removal

    Urbanowicz, Adam
    ;
    Shamiryan, Denis
    ;
    Marsik, Premysl
    ;
    Travaly, Youssef
    ;
    Verdonck, Patrick  
    Meeting abstract
    2008, Advanced Metallization Conference - AMC, 23/09/2008
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    Multi-plate misalignment artifacts in rotating-compensator ellipsometry: analysis and data treatment

    Marsik, Premysl
    ;
    Humlicek, Josef
    Journal article
    2008, Physica Status Solidi C, (5) 5, p.1064-1067
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    Optical property changes in low-k films upon ultraviolet-assisted curing

    Eslava Fernandez, Salvador
    ;
    Eymery, Guillaume
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    Marsik, Premysl
    ;
    Iacopi, Francesca
    Journal article
    2008, Journal of the Electrochemical Society, (155) 5, p.G115-G120
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    Spectroscopic ellipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films

    Marsik, Premysl
    ;
    Verdonck, Patrick  
    ;
    Schneider, Dieter
    ;
    De Roest, David  
    ;
    Kaneko, Shinya
    Journal article
    2008, Physica Status Solidi C, (5) 5, p.1253-1256

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