Browsing by Author "Marsik, Premysl"
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Publication Application of UV irradiation in removal of post-etch 193 nm photoresist
Proceedings paper2009, Materials, Processes and Reliability for Advanced Interconnects for Micro and Nanoelectronics, 13/04/2009, p.D02-09Publication Changes of UV optical properties of plasma damaged low-k dielectrics for sidewall damage scatterometry
;Marsik, Premysl ;Urbanowicz, Adam ;Vinokur, Klara ;Cohen, YoelBaklanov, MikhaïlProceedings paper2008, Materials and Processes for Advanced Interconnects for Microelectronics, 24/03/2008, p.1079-N07-04Publication Effect of pressure on efficiency of UV curing of CVD low-k material at different wavelengths
;Prager, Lutz ;Naumov, Sergei ;Pistol, L. ;Wennrich, L. ;Buchmeister, M. R.Marsik, PremyslMeeting abstract2008, 17th Workshop Materials for Advanced Metallization, 2/03/2008Publication Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths
;Prager, L. ;Marsik, Premysl ;Wennrich, L. ;Baklanov, Mikhaïl ;Naumov, S. ;Pistol, L.Schneider, D.Journal article2008, Microelectronic Engineering, (85) 10, p.2094-2097Publication Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance
Journal article2011, Thin Solid Films, (519) 11, p.3619-3626Publication Engineering of chemical and physical properties of low-k materials by different wavelength of UV light
Proceedings paper2008, ADMETA: Advanced Metallization Conference, 8/10/2008, p.28-29Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
;Urbanowicz, Adam ;Shamiryan, Denis ;Marsik, Premysl ;Travaly, YoussefJonas, AlainProceedings paper2009, Advanced Metallization Conference 2008 (AMC 2008), 22/09/2008, p.593-598Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
Meeting abstract2008, Advanced Metallization Conference - AMC, 23/09/2008Publication Multi-plate misalignment artifacts in rotating-compensator ellipsometry: analysis and data treatment
;Marsik, PremyslHumlicek, JosefJournal article2008, Physica Status Solidi C, (5) 5, p.1064-1067Publication Optical property changes in low-k films upon ultraviolet-assisted curing
;Eslava Fernandez, Salvador ;Eymery, Guillaume ;Marsik, PremyslIacopi, FrancescaJournal article2008, Journal of the Electrochemical Society, (155) 5, p.G115-G120Publication Spectroscopic ellipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films
Journal article2008, Physica Status Solidi C, (5) 5, p.1253-1256