Browsing by Author "Maruyama, K."
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Publication Better prediction on patterning failure mode with hotspot aware OPC modeling
Proceedings paper2021, Metrology, Inspection, and Process Control for Microlithography XXXIV, 22/02/2021, p.1161112Publication Massive e-beam metrology and inspection for analysis of EUV stochastic defect
Proceedings paper2021, Metrology, Inspection, and Process Control for Microlithography XXXIV, 22/02/2021, p.1161129Publication Massive metrology of 2D logic patterns on BEOL EUVL
Proceedings paper2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/03/2020, p.113250JPublication Realizing more accurate OPC models by utilizing SEM contours
;Wei, C. ;Sejpal, R. ;Deng, Y. ;Kusnadi, I. ;Fenger, G. ;Oya, M. ;Okamoto, Y. ;Maruyama, K.Yamazaki, Y.Proceedings paper2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/03/2020, p.1132524