Browsing by Author "Mountsier, Tom"
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Publication Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node
Proceedings paper2015, Design-Process-Technology Co-optimization for Manufacturability IX, 22/02/2015, p.94270OPublication New bending mode in SAQP Si fins and its mitigation
Journal article2022, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, (141) April, p.Art. 106437Publication Process sensitivity analysis for EPE optimization of MP18 SALELE BEOL patterning
Proceedings paper2025, 2025 Conference on Metrology Inspection and Process Control-Annual, FEB 24-28, 2025, p.1