Browsing by Author "Muelders, Thomas"
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Publication Calibration of physical resist models for simulation of extreme ultraviolet lithography
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13007Publication Impact of mask three dimensional effects on resist-model calibration
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3 Letters), (8) 3, p.30501Publication Physical resist models and their calibration: their readiness for accurate EUV lithography simulation
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763619