Browsing by Author "Muller, Matthias"
Now showing 1 - 7 of 7
- Results Per Page
- Sort Options
Publication ALD on high mobility channels: engineering the proper gate stack passivation
Proceedings paper2010, Atomic Layer Deposition Applications 6, 10/10/2010, p.9-23Publication Atomic layer deposition of Al2O3 on S-passivated Ge
Journal article2011, Microelectronic Engineering, (88) 7, p.1553-1556Publication Atomic layer deposition of high-k dielectrics on sulphur-passivated germanium
Journal article2011, Journal of the Electrochemical Society, (158) 7, p.H687-H692Publication S-passivation of the Ge gate stack using (NH4)2S
Meeting abstract2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS, 20/09/2010, p.7.4Publication S-passivation of the Ge gate stack: Tuning the gate stack properties by changing the atomic layer deposition oxidant precursor
Journal article2011, Journal of Applied Physics, (110) 8, p.84907Publication Self-affine surface roughness of chemically and thermally cleaned Ge surfaces
Journal article2011, Journal of the Electrochemical Society, (158) 10, p.H1090-H1096Publication Towards passivation of Ge(100) surfaces by sulfur adsorption from (NH4)2S solution: a combined NEXAFS, STM and LEED study
Journal article2011, Journal of the Electrochemical Society, (158) 5, p.H589-H594