Browsing by Author "Nicolosi, T."
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Publication A theoretical and experimental study of damage-free BEOL cleaning with megasonic agitation
Publication Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
Proceedings paper2001, Ultra Clean Processing of Silicon Surfaces 2000: Proceedings of the 5th International Conference - UCPSS, 18/09/2000, p.254-254Publication Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry
Proceedings paper2000, Proceedings of the 9th International Symposium on Semiconductor Manufacturing - ISSM, 26/09/2000, p.157-160Publication Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz
Proceedings paper2002, Cleaning Technology in Semiconductor Device Manufacturing VII, 4/09/2001, p.145-146Publication Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz
Meeting abstract2001, 200th International Meeting Electrochemical Society: 7th International Symposium on Cleaning Technology in Semiconductor Device, 2/09/2001