Browsing by Author "Niwa, M."
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Publication 45nm LSTP FET with FUSI gate on PVD-HfO2 with excellent drivability by advanced PDA treatment
Journal article2005, Microelectronic Engineering, 80, p.7-10Publication Implementation of high-k gate dielectrics - a status update
Proceedings paper2003, Extended Abstracts of International Workshop on Gate Insulator - IWGI, 6/11/2003, p.10-14Publication Low Vt Ni-FUSI CMOS technology using a DyO cap layer with either single or dual Ni-phases
Proceedings paper2007, Symposium on VLSI Technology. Digest of Technical Papers, 14/06/2007, p.18-19Publication Scaling of HF-based gate dielectrics - intgeration with polysilicon gates
Proceedings paper2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.267-275Publication Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Proceedings paper2007, Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM, 18/09/2007, p.712-713