Browsing by Author "Onitsuka, Tomoya"

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Approaches to Enable Patterning of Tight Pitches towards High NA EUV

Tadatomo, Hiroki
;
Dauendorffer, Arnaud
;
Onitsuka, Tomoya
;
Genjima, Hisashi
;
Ido, Yasuyuki
Proceedings paper
2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.120560F
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

Dinh, Cong Que
;
Nagahara, Seiji
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Kuwahara, Yuhei
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Dauendorffer, Arnaud
;
Yoshida, Keisuke
Journal article
2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93
Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)

Onitsuka, Tomoya
;
Kawakami, Shinichiro
;
Dauendorffer, Arnaud
;
Shimura, Satoru
Proceedings paper
2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116091L