Browsing by Author "Parihar, V."
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Publication Analysis of As, P diffusion and defect evolution during sub-millisecond non-melt laser annealing based on an atomistic kinetic Monte Carlo approach
Proceedings paper2007, Technical Digest International Electron Devices Meeting - IEDM, 10/12/2007, p.955-958Publication Laser annealed junctions: process integration sequence optimization for advanced CMOS technologies
Proceedings paper2007, Extended Abstracts of the 7th International Workshop on Junction Technology, 8/06/2007, p.137-140Publication Modeling and experiments of dopant diffusion and defects for laser annealed junctions and advanced USJ
Proceedings paper2008, Doping Engineering for Front-End Processing, 24/03/2008, p.1070-E01-03Publication Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach
Proceedings paper2007, Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM, 18/09/2007, p.712-713Publication Ultra shallow junctions formed by sub-melt laser annealing
Proceedings paper2005, 13th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP, 4/10/2005, p.87-91Publication Ultra-shallow junctions formed by C co-implantation with spkie plus sub-melt laser annealing
Journal article2008, Journal of Vacuum Science and Technology B, (26) 1, p.281-285