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Browsing by Author "Patsis, G.P."

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    Determining the impact of statistical fluctuations on resist edge roughness

    Leunissen, Peter
    ;
    Ercken, Monique  
    ;
    Patsis, G.P.
    Journal article
    2005, Microelectronic Engineering, 78-79, p.2-10
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    Investigation of statistical Fluctuations on line edge rougness

    Leunissen, Peter
    ;
    Patsis, G.P.
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    Van Steenwinckel, David
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    Lammers, Jeroen
    Oral presentation
    2005, Charged Particle Lithography Workshop
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    Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions

    Constantoudis, V.
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    Patsis, G.P.
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    Leunissen, Peter
    ;
    Gogolides, E.
    Journal article
    2004-08, Journal of Vacuum Science and Technology B, (22) 4, p.1974-1981
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    Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images

    Patsis, G.P.
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    Constantoudis, V.
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    Tserepi, A.
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    Gogolides, E.
    ;
    Grozev, Grozdan  
    Journal article
    2003, Journal of Vacuum Science & Technology B, (21) 3, p.1008-1018
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    Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis

    Patsis, G.P.
    ;
    Constantoudis, V.
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    Tserepi, A.
    ;
    Gogolides, E.
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    Grozev, Grozdan  
    ;
    Hoffmann, Thomas
    Journal article
    2003, Microelectronic Engineering, 67-68, p.319-325
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    Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness

    Drygianakis, D.
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    Nijkerk, M.D.
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    Patsis, G.P.
    ;
    Kokkoris, G.
    ;
    Raptis, I.
    ;
    Leunissen, Peter
    Proceedings paper
    2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65193T

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