Browsing by Author "Patsis, G.P."
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Publication Determining the impact of statistical fluctuations on resist edge roughness
Journal article2005, Microelectronic Engineering, 78-79, p.2-10Publication Investigation of statistical Fluctuations on line edge rougness
;Leunissen, Peter ;Patsis, G.P. ;Van Steenwinckel, DavidLammers, JeroenOral presentation2005, Charged Particle Lithography WorkshopPublication Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions
;Constantoudis, V. ;Patsis, G.P. ;Leunissen, PeterGogolides, E.Journal article2004-08, Journal of Vacuum Science and Technology B, (22) 4, p.1974-1981Publication Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
Journal article2003, Journal of Vacuum Science & Technology B, (21) 3, p.1008-1018Publication Roughness analysis of lithographically produced nanostructures: off-line measurement and scaling analysis
Journal article2003, Microelectronic Engineering, 67-68, p.319-325Publication Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness
;Drygianakis, D. ;Nijkerk, M.D. ;Patsis, G.P. ;Kokkoris, G. ;Raptis, I.Leunissen, PeterProceedings paper2007, Advances in Resist Materials and Processing Technology XXIV, 25/02/2007, p.65193T