Browsing by Author "Pawlowski, G."
Now showing 1 - 4 of 4
- Results Per Page
- Sort Options
Publication Optimization of an advanced positive DUV photoresist towards 150 nm and beyond
Oral presentation1999, MNE'99 - Micro and Nano Engineering ConferencePublication Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Oral presentation1998, MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.Publication Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing
Journal article1999, Microelectronic Engineering, (46) 1_4, p.353-357Publication Optimization of an advanced positive tone DUV photoresist towards 150nm and beyond
Journal article2000, Microelectronic Engineering, (53) 1_4, p.443-447