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Browsing by Author "Pinho, Nelson"

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    Advances in Photosensitive Polymer Based Damascene RDL Processes: Toward Submicrometer Pitches With More Metal Layers

    Chery, Emmanuel  
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    Slabbekoorn, John  
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    Pinho, Nelson
    ;
    Miller, Andy  
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    Beyne, Eric  
    Proceedings paper
    2021, IEEE 71st Electronic Components and Technology Conference (ECTC), JUN 01-JUL 04, 2021, p.340-346
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    Cost-effective RF interposer platform on low-resistivity Si enabling heterogeneous integration opportunities for beyond 5G

    Sun, Xiao  
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    Slabbekoorn, John  
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    Sinha, Siddhartha  
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    Bex, Pieter  
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    Pinho, Nelson  
    ;
    Webers, Tomas  
    Proceedings paper
    2022, 72nd IEEE Electronic Components and Technology Conference (ECTC), MAY 31-JUN 01, 2022, p.7-11
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    III-V/III-N technologies for next generation high-capacity wireless communication

    Collaert, Nadine  
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    Alian, AliReza  
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    Banerjee, Aritra  
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    Boccardi, Guillaume  
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    Cardinael, Pieter  
    Proceedings paper
    2022, International Electron Devices Meeting (IEDM), DEC 03-07, 2022
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    Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability

    Pinho, Nelson  
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    Chery, Emmanuel  
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    Bhatia, Ritwik
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    Sundaram, Ganesh
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    Slabbekoorn, John  
    Proceedings paper
    2023, IEEE 73rd Electronic Components and Technology Conference (ECTC), MAY 30-JUN 02, 2023, p.2040-2045
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    Inorganic Capping Layers in RDL Technologies: Process Advantages and Reliability

    Chery, Emmanuel  
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    Brady-Boyd, Anita
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    Bhatia, Ritwik
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    Pinho, Nelson  
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    Slabbekoorn, John  
    Journal article
    2023, JOM, (75) 12, p.5096-5102
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    Process development for a novel low loss and non-PFAS photo imageable dielectric for RF silicon interposer applications

    Jafarpoorchekab, Hamideh  
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    Sun, Xiao  
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    Uruena, Angel  
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    Sinha, Siddhartha  
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    Pinho, Nelson  
    Proceedings paper
    2024, 2024 International 3D Systems Integration Conference, SEP 25-27, 2024
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    Reliability Investigations of Advanced Photosensitive Polymer based RDL Processes Protected by Inorganic Capping Layers

    Chery, Emmanuel  
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    Bhatia, Ritwik
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    Sundaram, Ganesh
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    Pinho, Nelson  
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    Beyne, Eric  
    Proceedings paper
    2024, IEEE 74th Electronic Components and Technology Conference (ECTC), MAY 28-31, 2024, p.647-653
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    Semi-Additive Fine Pitch RDL Litho-Process Development of 1000nm CD using low-NA 300mm i-line Stepper

    Wang, Lili  
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    Pak, Murat  
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    Pinho, Nelson  
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    Slabbekoorn, John  
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    Miller, Andy  
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    Beyne, Eric  
    Proceedings paper
    2024, 10th IEEE Electronics System-Integration Technology Conference (ESTC), SEP 11-13, 2024
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    Ultra-Fine Pitch RDL (UFPRDL) using Polymer Dual Damascene processing

    Pinho, Nelson  
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    Chery, Emmanuel  
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    Pantano, Nicolas  
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    Slabbekoorn, John  
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    Miller, Andy  
    ;
    Beyne, Eric  
    Proceedings paper
    2023, IEEE 73rd Electronic Components and Technology Conference (ECTC), MAY 30-JUN 02, 2023, p.1364-1368

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