Browsing by Author "Pique, Didier"
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Publication Bulk properties of MOCVD-deposited HfO2 layers for high-k dielectric applications
Journal article2004, Journal of the Electrochemical Society, (151) 10, p.F228-F234Publication Composition and growth kinetics of the interfacial layer for MOCVD HfO2 layers on Si substrates
; ; ; ; Publication Electrical properties of MOCVD HfO2 dielectric layers with polysilicon gate electrodes for CMOS applications
Proceedings paper2003, 14th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference - ASMC, 31/03/2003, p.133-136Publication Scalability of MOCVD-deposited Hafnium oxide
; ; ; ; Proceedings paper2003, CMOS Front-End Materials and Process Technology, 21/04/2003, p.59-64Publication Scaling of high-k dielectrics towards sub-1nm EOT
Proceedings paper2003, IEEE International Symposium on VLSI Technology, Systems, and Applications, 23/04/2003, p.251-254Publication Ultra thin plasma nitrided oxides for sub-100nm CMOS
Oral presentation2002, 5th Technical and Scientific Meeting of CREMSI: New Tools and Processes for Thin Active Layers in the Advanced FEOL Techniques