Browsing by Author "Pittevils, Joris"
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Publication Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry
Meeting abstract2011, 4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM, 5/05/2011Publication Influence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applications
Meeting abstract2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS, 20/09/2010, p.56-57Publication Modification of BARC layer by UV irradiation for post-etch wet strip applications in BEOL
Meeting abstract2010, 3rd International Plasma Etch and Strip in Microelectronics Workshop - PESM, 4/03/2010Publication Towards fully aqueous ozone wet strip of 193 nm photoresist stack using UV pre-treatments in low-k patterning applications
Journal article2012, Journal of the Electrochemical Society, (159) 5, p.D287-D295