Browsing by Author "Randall, John"
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Publication Automated OPC for application in advanced lithography
Proceedings paper1997, Photomask and X-Ray Mask Technology IV, 17/04/1997, p.138-144Publication Lithography simulation with aerial image - variable threshold resist model
Publication Lithography simulation with aerial image-variable threshold resist model
Publication Optically induced mask criical dimension error magnification in 248 nm lithography
Publication Proximity effects correction for advanced optical lithography processes
Journal article1998, Japanese Journal of Applied Physics. Part 1: Regular Papers, (37) 6A, p.3585-3593Publication Reduction of mask induced CD errors by optical proximity correction
Proceedings paper1998, Optical Microlithography XI, 25/02/1998, p.124-130Publication Some challenges for mask making to keep up with the roadmap
Proceedings paper1998, 18th Annual BACUS Symposium on Photomask Technology and Management, 16/09/1998, p.313-324Publication Some challenges for mask making to keep up with the roadmap
Oral presentation1998, 15th European Conference on Mask Making Technology for Integrated Circuits and Micro-Components; 16-17 November 1998; Munchen, GPublication Sub-resolution feature OPC as an enabler for manufacturing at 0.2 μm and below
Journal article1998, Microelectronic Engineering, 41/42, p.83-86Publication Variable threshold resist models for lithography simulation
Proceedings paper1999, Optical Microlithography XII, 17/03/1999, p.176-182