Browsing by Author "Rodriguez, Leonard"
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Publication Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors
Journal article2012, Chemical Vapor Deposition, (18) 7_9, p.225-238Publication In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS
;Rodriguez, Leonard ;De Clercq, Astrid ;Tallarida, MassimoCuypers, DanielOral presentation2012, AVS 59th International Symposium & ExhibitionPublication In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS
;Rodriguez, Leonard ;De Clercq, Astrid ;Tallarida, MassimoCuypers, DanielMeeting abstract2012, AVS 59th International Symposium & Exhibition, 29/10/2012Publication In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces
Meeting abstract2012, 39th Conference on the Physics and Chemistry of Surfaces and Interfaces - PCSI, 22/01/2012Publication Interface chemistry of Al2O3/III-V upon atomic layer deposition
Oral presentation2012, E-MRS Spring Meeting Symposium M: More than MoorePublication Molecular Layer Deposition of organic-inorganic hybrid materials for implant BARC applications
Meeting abstract2013, AVS 60th International Symposium & Exhibition, 27/10/2013, p.53Publication Process study of gadolinium aluminate atomic layer deposition from the gadolinium tris-diisopropylacetamidinate precursor
Journal article2012, Journal of Vacuum Science and Technology A, (30) 1, p.01A140Publication Roughness evolution during the atomic layer deposition of metal oxides
Journal article2013, Journal of Vacuum Science and Technology A, (6) 31, p.61501Publication Study of InP surfaces after wet chemical treatments
Proceedings paper2013, Semiconductor Cleaning Science and Technology 13, 27/10/2013, p.297-303Publication Study of InP surfaces after wet chemical treatments
Journal article2014, ECS Journal of Solid State Science and Technology, (3) 1, p.N3016-N3022Publication Study of InP surfaces after wet chemical treatments
Meeting abstract2013, 224th ECS Fall Meeting, 27/10/2013, p.2132Publication Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide
Journal article2013, Chemistry of Materials, (25) 7, p.1078-1091Publication Wet chemical etching of InP for cleaning applications: II. Oxide removal
Journal article2013, ECS Journal of Solid State Science and Technology, (2) 4, p.P190-P194