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Browsing by Author "Rodriguez, Leonard"

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    Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors

    Adelmann, Christoph  
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    Delabie, Annelies  
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    Schepers, Bart
    ;
    Rodriguez, Leonard
    ;
    Franquet, Alexis  
    Journal article
    2012, Chemical Vapor Deposition, (18) 7_9, p.225-238
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    In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

    Rodriguez, Leonard
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    De Clercq, Astrid
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    Tallarida, Massimo
    ;
    Cuypers, Daniel
    Oral presentation
    2012, AVS 59th International Symposium & Exhibition
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    In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS

    Rodriguez, Leonard
    ;
    De Clercq, Astrid
    ;
    Tallarida, Massimo
    ;
    Cuypers, Daniel
    Meeting abstract
    2012, AVS 59th International Symposium & Exhibition, 29/10/2012
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    In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces

    Adelmann, Christoph  
    ;
    Tallarida, Massimo
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    Cuypers, Daniel
    ;
    Rodriguez, Leonard
    Meeting abstract
    2012, 39th Conference on the Physics and Chemistry of Surfaces and Interfaces - PCSI, 22/01/2012
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    Interface chemistry of Al2O3/III-V upon atomic layer deposition

    Tallarida, Massimo
    ;
    Adelmann, Christoph  
    ;
    Cuypers, Daniel
    ;
    Rodriguez, Leonard
    ;
    Lin, Dennis  
    Oral presentation
    2012, E-MRS Spring Meeting Symposium M: More than Moore
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    Molecular Layer Deposition of organic-inorganic hybrid materials for implant BARC applications

    Rodriguez, Leonard
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    Adelmann, Christoph  
    ;
    Sutens, Ben
    ;
    Winroth, Gustaf
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    Delabie, Annelies  
    Meeting abstract
    2013, AVS 60th International Symposium & Exhibition, 27/10/2013, p.53
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    Process study of gadolinium aluminate atomic layer deposition from the gadolinium tris-diisopropylacetamidinate precursor

    Rodriguez, Leonard
    ;
    Franquet, Alexis  
    ;
    Brijs, Bert
    ;
    Tielens, Hilde  
    ;
    Adelmann, Christoph  
    Journal article
    2012, Journal of Vacuum Science and Technology A, (30) 1, p.01A140
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    Roughness evolution during the atomic layer deposition of metal oxides

    Peter, Antony  
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    Delabie, Annelies  
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    Rodriguez, Leonard
    ;
    Moussa, Alain  
    ;
    Adelmann, Christoph  
    Journal article
    2013, Journal of Vacuum Science and Technology A, (6) 31, p.61501
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    Study of InP surfaces after wet chemical treatments

    Cuypers, Daniel
    ;
    van Dorp, Dennis  
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    Tallarida, Massimo
    ;
    Brizzi, Simone
    ;
    Rodriguez, Leonard
    Proceedings paper
    2013, Semiconductor Cleaning Science and Technology 13, 27/10/2013, p.297-303
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    Study of InP surfaces after wet chemical treatments

    Cuypers, Daniel
    ;
    van Dorp, Dennis  
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    Tallarida, Massimo
    ;
    Brizzi, Simone
    ;
    Conard, Thierry  
    Journal article
    2014, ECS Journal of Solid State Science and Technology, (3) 1, p.N3016-N3022
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    Study of InP surfaces after wet chemical treatments

    Cuypers, Daniel
    ;
    van Dorp, Dennis  
    ;
    Tallarida, Massimo
    ;
    Brizzi, Simone
    ;
    Conard, Thierry  
    Meeting abstract
    2013, 224th ECS Fall Meeting, 27/10/2013, p.2132
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    Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

    Adelmann, Christoph  
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    Cuypers, Daniel
    ;
    Tallarida, Massimo
    ;
    Rodriguez, Leonard
    Journal article
    2013, Chemistry of Materials, (25) 7, p.1078-1091
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    Wet chemical etching of InP for cleaning applications: II. Oxide removal

    van Dorp, Dennis  
    ;
    Cuypers, Daniel
    ;
    Arnauts, Sophia  
    ;
    Moussa, Alain  
    ;
    Rodriguez, Leonard
    Journal article
    2013, ECS Journal of Solid State Science and Technology, (2) 4, p.P190-P194

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