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Browsing by Author "Scappucci, Giordano"

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    Ga-doped Ge and [B + Ga] Co-doped SiGe epitaxial source-drain for Sub-7 nm logic devices

    Porret, Clément  
    ;
    Margetis, Joe
    ;
    Tolle, John
    ;
    Sammak, Amir
    ;
    Scappucci, Giordano
    Meeting abstract
    2018, 1st Joint ISTDM / ICSI 2018 Conference, 27/05/2018
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    Photoluminescence of phosphorus atomic layer doped Ge grown on Si

    Yamamoto, Yuji
    ;
    Nien, Li-Wei
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    Capellini, Giovanni
    ;
    Virgilio, Michele
    ;
    Costina, Ioan
    Journal article
    2017, Semiconductor Science and Technology, (32) 10, p.104005
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    Very low temperature epitaxy of group-IV semiconductors for use in FinFET, stacked nanowires and monolithic 3D integration

    Porret, Clément  
    ;
    Hikavyy, Andriy  
    ;
    Gomez Granados, Fernando
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    Baudot, Sylvain  
    ;
    Vohra, Anurag  
    Journal article
    2019, ECS Journal of Solid State Science and Technology, (8) 8, p.P392-P399
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    Very low temperature epitaxy of group-IV semiconductors for use in FinFET, stacked nanowires and monolithic 3D integration

    Porret, Clément  
    ;
    Hikavyy, Andriy  
    ;
    Gomez Granados, Juan Fernando  
    ;
    Baudot, Sylvain  
    ;
    Vohra, Anurag  
    Proceedings paper
    2018, SiGe, Ge, and Related Materials: Materials, Processing, and Devices 8, 30/09/2018, p.163-175
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    Very low temperature epitaxy of group-IV semiconductors for use in finFET, stacked nanowires and monolithic 3D integration

    Porret, Clément  
    ;
    Hikavyy, Andriy  
    ;
    Gomez Granados, Juan Fernando  
    ;
    Baudot, Sylvain  
    ;
    Vohra, Anurag  
    Meeting abstract
    2018, ECS Fall Meeting, SiGe & Ge Symposium, 30/09/2018, p.1050

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