Browsing by Author "Schepers, Bart"
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Publication Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors
Journal article2012, Chemical Vapor Deposition, (18) 7_9, p.225-238Publication Atomic-layer-deposited tantalum silicate as a gate dielectric for III-V MOS devices
Journal article2011, Microelectronic Engineering, (88) 7, p.1098-1100Publication In depth analysis of 3D NAND enablers in gate stack integration and demonstration in 3D devices
Proceedings paper2017, International Memory Workshop, 14/05/2017, p.1-4Publication Process characterization for donut TSV's
Meeting abstract2014, International Wafer-Level Packaging Conference - IWLPC, 11/11/2014