Browsing by Author "Schmeisser, Dieter"
- Results per page
- Sort Options
Publication ALD on high mobility channels: engineering the proper gate stack passivation
Proceedings paper2010, Atomic Layer Deposition Applications 6, 10/10/2010, p.9-23Publication Amorphous gadolinium aluminate as a dielectric and sulfur for indium phosphide passivation
Journal article2019, ACS Applied Electronic Materials, (1) 11, p.2190-2201Publication GaAs clean up studied with synchrotron radiation photoemission
Proceedings paper2012, E-MRS Spring Meeting Symposium M: More than Moore: Novel materials approaches for functionalized Silicon based Microelectronics, 14/05/2012, p.12003Publication Graphene oxide monolayers as an atomically thin seeding layers for atomic layer deposition of metal oxides
Journal article2015, Nanoscale, 7, p.10781-10789Publication In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces
Meeting abstract2012, 39th Conference on the Physics and Chemistry of Surfaces and Interfaces - PCSI, 22/01/2012Publication Interface chemistry of Al2O3/III-V upon atomic layer deposition
Oral presentation2012, E-MRS Spring Meeting Symposium M: More than MoorePublication On the scalability of doped hafnia thin films
Journal article2014-03, Applied Physics Letters, (104) 12, p.122906Publication Sacrificial self-assembled monolayers for the passivation of GaAs (100) surfaces and interfaces
Journal article2016, Chemistry of Materials, (28) 16, p.5689-5701Publication Scalability of doped cubic HfO2 films
Meeting abstract2013, AVS 60th International Symposium & Exhibition, 27/10/2013, p.62Publication Study of InP surfaces after wet chemical treatments
Meeting abstract2013, 224th ECS Fall Meeting, 27/10/2013, p.2132Publication Study of InP surfaces after wet chemical treatments
Journal article2014, ECS Journal of Solid State Science and Technology, (3) 1, p.N3016-N3022Publication Study of InP surfaces after wet chemical treatments
Proceedings paper2013, Semiconductor Cleaning Science and Technology 13, 27/10/2013, p.297-303Publication Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum
Journal article2011-07, Applied Physics Letters, (99) 4, p.42906Publication Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide
Journal article2013, Chemistry of Materials, (25) 7, p.1078-1091Publication Understanding the interface reactions of rutile TiO2 grown by atomic layer deposition on oxidized ruthenium
Journal article2013, ECS Journal of Solid State Science and Technology, (2) 1, p.N23-N27