Browsing by Author "Schreel, Koen"
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Publication Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography
; ; ; Publication Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Journal article2011-03, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13008Publication Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Proceedings paper2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009Publication Optical proximity stability control of ArF immersion clusters
; ; ; ; Cheng, ShauneeProceedings paper2011, Optical Microlithography XXIV, 27/02/2011, p.79731IPublication Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography
; ; ; Publication Scanner matching for standard and freeform illumination shapes using FlexRay
Proceedings paper2011, Optical Microlithography XXIV, 27/02/2011, p.79731IPublication Tool-to-tool optical proximity effect matching
; ; ; ; Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69241Q