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Browsing by Author "Snow, J."

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    Aging phenomena in the removal of nano-particles from Si wafers

    Vereecke, Guy  
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    Veltens, J.
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    Xu, Kaidong
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    Eitoku, A.
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    Sano, Ken-Ichi
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    Arnauts, Sophia  
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    Kenis, Karine  
    Proceedings paper
    2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.151-154
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    Challenges of single-wafer wet cleaning for low temperature pre-epitaxial treatment of SiGe

    Sano, K.
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    Leys, Frederik
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    Dilliway, Gabriela
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    Loo, Roger  
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    Mertens, Paul  
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    Snow, J.
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    Izumi, A.
    Proceedings paper
    2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.243-246
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    New wet process strategies for reduced La2O3 and MgO2 high-k cap-dielectric loss

    Wada, Masayuki
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    Vos, Rita  
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    Claes, Martine  
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    Schram, Tom  
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    Snow, J.
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    Mertens, Paul  
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    Eitoku, A.
    Proceedings paper
    2009, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11, 5/10/2009, p.45-51
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    New wet process strategies for reduced La2O3 and MgO2 high-k cap-dielectric loss

    Wada, Masayuki
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    Vos, Rita  
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    Claes, Martine  
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    Schram, Tom  
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    Snow, J.
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    Mertens, Paul  
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    Eitoku, Atsuro
    Meeting abstract
    2009, 216th ECS Meeting, 4/10/2009, p.2058
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    Removal of nano-particles by mixed-fluid jet: evaluation of cleaning performance and comparison with megasonic

    Vereecke, Guy  
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    Veltens, T.
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    Eitoku, A.
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    Sano, Ken-Ichi
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    Doumen, Geert  
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    Fyen, Wim
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    Wostyn, Kurt  
    Proceedings paper
    2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.193-196
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    Single-wafer wet chemical oxide formation for pre-ALD high-k deposition on 300 mm wafer

    Sano, K.
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    Izumi, A.
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    Eitoku, A.
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    Snow, J.
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    Nyns, Laura  
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    Kubicek, Stefan  
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    Singanamalla, Raghunath
    Proceedings paper
    2008, Ultra Clean Processing of Semiconductor Surfaces VIII - UCPSS, 18/09/2006, p.53-56

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